CF4 PLASMA TREATMENT OF ASYMMETRIC POLYSULFONE MEMBRANES

Authors
HOPKINS J BADYAL JPS
Citation
J. Hopkins et Jps. Badyal, CF4 PLASMA TREATMENT OF ASYMMETRIC POLYSULFONE MEMBRANES, Langmuir, 12(15), 1996, pp. 3666-3670
Citations number
49
Categorie Soggetti
Chemistry Physical
Journal title
Langmuir → ACNP
ISSN journal
07437463
Volume
12
Issue
15
Year of publication
1996
Pages
3666 - 3670
Database
ISI
SICI code
0743-7463(1996)12:15<3666:CPTOAP>2.0.ZU;2-2
Abstract
CF4 glow discharge treatment; of asymmetric polysulfone membranes has been investigated by X-ray photoelectron spectroscopy (XPS), atomic fo rce microscopy (AFM), and gas permeability measurements. Oxygen and ni trogen gas permeability and permselectivity through the polysulfone su bstrate are found to be strongly influenced by the plasma-processing p arameters.