The use of optical Moire patterns for motion and microtribology detect
ion of micromechanical devices has been proposed and demonstrated, Usi
ng a very simple image processing technique, 50-nm in-plane motion of
a micromechanical sensor has been detected, With an improved device de
sign, the spatial resolution for in-plane motion detection will be abl
e to reach 10 nm, meeting the most stringent requirement for any known
applications for microelectromechanical systems (MEMS).