VISIBLE ELECTROLUMINESCENCE FROM NANOCRYSTALLITES OF SILICON FILMS PREPARED BY PLASMA-ENHANCED CHEMICAL-VAPOR-DEPOSITION

Citation
S. Tong et al., VISIBLE ELECTROLUMINESCENCE FROM NANOCRYSTALLITES OF SILICON FILMS PREPARED BY PLASMA-ENHANCED CHEMICAL-VAPOR-DEPOSITION, Applied physics letters, 69(5), 1996, pp. 596-598
Citations number
20
Categorie Soggetti
Physics, Applied
Journal title
ISSN journal
00036951
Volume
69
Issue
5
Year of publication
1996
Pages
596 - 598
Database
ISI
SICI code
0003-6951(1996)69:5<596:VEFNOS>2.0.ZU;2-U
Abstract
We have observed visible electroluminescence (EL) from silicon nanocry stallites which are embedded in a-Si:H films prepared in a plasma enha nced chemical vapor deposition system. The EL spectra are in the range of 500-850 nm with two peaks located at about 630-680 and 730 nm, res pectively. We found that the intensity of EL peaks is related closely to the conductivity of the deposited films. The carrier conduction pat h is discussed in terms of the material structural characteristics, an d a tentative explanation of the light emission mechanism is proposed. (C) 1996 American Institute of Physics.