S. Tong et al., VISIBLE ELECTROLUMINESCENCE FROM NANOCRYSTALLITES OF SILICON FILMS PREPARED BY PLASMA-ENHANCED CHEMICAL-VAPOR-DEPOSITION, Applied physics letters, 69(5), 1996, pp. 596-598
We have observed visible electroluminescence (EL) from silicon nanocry
stallites which are embedded in a-Si:H films prepared in a plasma enha
nced chemical vapor deposition system. The EL spectra are in the range
of 500-850 nm with two peaks located at about 630-680 and 730 nm, res
pectively. We found that the intensity of EL peaks is related closely
to the conductivity of the deposited films. The carrier conduction pat
h is discussed in terms of the material structural characteristics, an
d a tentative explanation of the light emission mechanism is proposed.
(C) 1996 American Institute of Physics.