P. Radojkovic et al., COULOMB STAIRCASE WITH NEGATIVE DIFFERENTIAL RESISTANCE AT ROOM-TEMPERATURE FOR A METAL TIP METAL DOT SEMICONDUCTOR DOUBLE JUNCTION, Surface science, 362(1-3), 1996, pp. 890-893
Nanometer-sized Au dots have been fabricated on p-type Si(111) substra
tes by field-induced transfer of tip material in a scanning tunneling
microscope (STM). Positioning the STM tip on a very small dot (10-15 n
m in diameter) allows observation of equidistant steps with a spacing
of several 100 mV and regions with negative differential resistance (N
DR) in the current-voltage characteristic. Numerical simulations confi
rm that the capacitance between the tip and the Au dot falls into the
10(-19) F range. The occurrence of NDR might be explained by a leaking
of excess carriers from the dot to the immediate surroundings.