Threshold conduction was studied in Si MOSFET samples with mobility ra
nging from 5000 to 55 000 cm(2)/V . s, and in the wide temperature ran
ge 20 mK-4 K. We found that non-ohmic conduction is qualitatively diff
erent in low and high mobility samples near and far from the critical
density. In the high mobility samples we observed a novel feature, in
that the differential resistance changes sign slightly above the thres
hold.