CHARACTERIZATIONS OF TITANIUM-OXIDE FILMS PREPARED BY RADIO-FREQUENCYMAGNETRON SPUTTERING

Titanium oxide films have been deposited on glass substrates (50 x 20 mm(2)) and on (100) silicon wafers (10 x 10 mm(2)) by r.f. reactive ma gnetron sputtering from a 99.6% pure titanium target. The microstructu re of these films has been characterized by atomic force microscopy. O ptical properties have been measured using optical transmission UV-vis spectrum and colour measurements have been carried out in the CIELAB system of colorimetry. The effects of the oxygen partial pressure and the total sputtering pressure on the surface morphology, optical and e lectrical properties have been investigated and the stoichiometry of t he layers has been determined by Rutherford backscattering spectroscop y measurements. The experimental results indicate an increase of layer s' density with the oxygen partial pressure and a decrease of this den sity with the total pressure.