ARC EVAPORATED TI-N FILMS WITH REDUCED MACROPARTICLE CONTAMINATION

Citation
J. Kourtev et al., ARC EVAPORATED TI-N FILMS WITH REDUCED MACROPARTICLE CONTAMINATION, Thin solid films, 287(1-2), 1996, pp. 202-207
Citations number
17
Categorie Soggetti
Physics, Applied","Material Science","Physics, Condensed Matter
Journal title
ISSN journal
00406090
Volume
287
Issue
1-2
Year of publication
1996
Pages
202 - 207
Database
ISI
SICI code
0040-6090(1996)287:1-2<202:AETFWR>2.0.ZU;2-F
Abstract
Through effective magnetic are steering and optimization of the modes of reactive deposition and ion assistance, Ti-N films with reduced dro plet contamination were produced. Are steering was accomplished by two small-sized rotating electromagnets with low power consumption (< 100 W). The maximum size and the number density of the droplets greater t han 1 mu m on the surface of the deposited Ti-N films did not exceed 4 mu m and 4000 mm(-2), respectively. These characteristics make the Ti -N coatings obtained in the present contribution superior to Ti-N film s produced by are deposition methods currently used for industrial app lications, Moreover, the Ti-N films investigated are characterized wit h dense structure, smooth surface, good adhesion, high microhardness a nd corrosion resistance. These Ti-N films could find successful applic ation as wear- and corrosion-resistant coatings on cutting and forming tools.