T. Akermark et al., RELEASE OF WATER AND HYDROGEN DURING OUTGASSING OF SOME MATERIALS, Journal of materials engineering and performance, 5(4), 1996, pp. 516-520
An outgassing (vacuum annealing) procedure was used in combination wit
h mass spectrometry to study gas release from pure copper, pure silico
n, an Al97Mg alloy, and type 316 stainless steel, This paper focuses o
n the possibility of separating the different contributions to the tot
al outgassing of a sample that has undergone a typical surface prepara
tion procedure, These contributions have been divided into (1) release
from bulk, (2) species introduced in grinding, and (3) species due to
air exposure at room temperature. The reaction chamber was made of qu
artz and stainless steel, and the water release from these surfaces wa
s measured separately. In air exposure of the reaction chamber walls,
an uptake corresponding to one to two monomolecular layers of water wa
s measured. This water layer was 85% desorbed in vacuum after 120 h at
room temperature, The detection limit of the method is similar to 50
ppb hydrogen, and all samples investigated contained hydrogen in the 1
000 ppb range. The species introduced during grinding were considerabl
e, except for silicon. A significant hydrogen release was found for si
licon and Als?Mg as a result of air exposure at room temperature, but
not for copper or type 316 stainless steel.