Amorphous carbon, deposited as a thin film (similar to 47 nm thick) on
a silica prism, has been characterised, for the first time over a ran
ge of wavelengths, using attenuated total internal reflection. By meas
uring angular dependent reflectivities from the prism-carbon interface
in the region of the critical angle with subsequent fitting of the da
ta to Fresnel theory, both the real and imaginary parts of the dielect
ric function are obtained. The wavelength dependence of these two vari
ables has thereby been established between 450 and 840 nm. Extension o
f this range for the imaginary component to 200 nm, by optical absorpt
ion measurements, has allowed discrimination between two different mod
els describing the electron states at the band edge in this material.