NEW TECHNIQUE OF MEASUREMENT OF OPTICAL-PARAMETERS OF THIN-FILMS

Authors
HLAVKA J OHLIDAL I VIZDA F SITTER H
Citation
J. Hlavka et al., NEW TECHNIQUE OF MEASUREMENT OF OPTICAL-PARAMETERS OF THIN-FILMS, Thin solid films, 279(1-2), 1996, pp. 209-212
Citations number
9
Categorie Soggetti
Physics, Applied","Material Science","Physics, Condensed Matter
Journal title
Thin solid films → ACNP
ISSN journal
00406090
Volume
279
Issue
1-2
Year of publication
1996
Pages
209 - 212
Database
ISI
SICI code
0040-6090(1996)279:1-2<209:NTOMOO>2.0.ZU;2-Q
Abstract
A new technique of measurement of the optical parameters of a thin fil m deposited on a semiconductor substrate, making use of the substrate photovoltage, is presented. The principle of the method is explained a nd an evaluation of the experimental data is given as a verification o f the technique.