CHEMICAL-VAPOR-DEPOSITION OF BORON-CARBON FILMS USING ORGANOMETALLIC REAGENTS

Authors
LEWIS JS VAIDYARAMAN S LACKEY WJ AGRAWAL PK FREEMAN GB BAREFIELD EK
Citation
Js. Lewis et al., CHEMICAL-VAPOR-DEPOSITION OF BORON-CARBON FILMS USING ORGANOMETALLIC REAGENTS, Materials letters, 27(6), 1996, pp. 327-332
Citations number
6
Categorie Soggetti
Material Science","Physics, Applied
Journal title
Materials letters → ACNP
ISSN journal
0167577X
Volume
27
Issue
6
Year of publication
1996
Pages
327 - 332
Database
ISI
SICI code
0167-577X(1996)27:6<327:COBFUO>2.0.ZU;2-Y
Abstract
The feasibility of using organoboranes as precursors for the depositio n of boron-carbon thin films in a hot-wall CVD furnace was investigate d. The reagents studied include trimethylborane, triethylborane, and t ributylborane. Triethylborane was the most suitable reagent in that hi gher boron to carbon ratios were obtained.