DEFECTS DEVELOPED IN NI-COATINGS DEPOSITED BY THE IMPULSE PLASMA ON METAL SUBSTRATES

In impulse plasma deposition (IPD), the only source of mass and energy is the coaxial impulse plasma accelerator and the quality of the IPD coatings depends strongly on the parameters of the deposition process. Certain parameters have been studied to determine their relation to t he morphological defects observed in IPD nickel coatings deposited on a range of metal substrates (Ni, Fe, Ti, Cu and Mo). It seems that for IPD the growth mechanism differs from that occurring in stationary PV D techniques so that the number and type of defects depend more on the process parameters than on the thermo-mechanical properties of the pa ir of the coating/substrate materials. Copyright (C) 1996 Elsevier Sci ence Ltd