FABRICATION OF LARGE ARRAYS OF MICRON-SCALE MAGNETIC FEATURES BY SELECTIVE-AREA ORGANOMETALLIC CHEMICAL-VAPOR-DEPOSITION

We demonstrate that it is possible to deposit a wide range of magnetic features, using photoassisted selective area organometallic chemical vapor deposition. Large arrays of identical micron-scale Ni features w ere deposited on a Si(111) wafer by this method. Their magnetic proper ties were studied by alternating gradient force magnetometry as well a s magnetic force microscopy. Our morphological and magnetic measuremen ts show that the structures are spatially well defined, and the magnet ic properties are related to the structural shapes of the features. Th is method can be adapted to the fabrication of smaller-scale magnetic and electronic devices. (C) 1996 American Institute of Physics.