MONOLITHIC FORMATION OF THIN-FILMS ON THE VERTICAL SURFACE OF A SUBSTRATE BY A DUAL-ION-BEAM SPUTTERING TECHNIQUE

We have developed a novel method for the selective deposition of thin films on the vertical surface of a planar substrate with a vertical st ep. This was done with a dual-ion-beam sputtering apparatus that is eq uipped with two ion-beam sources. Using this technique a multilayer fi lter was monolithically formed on the vertical surface of a Si substra te on which a photodetector had been fabricated, and clear filtering-p hotodetecting characteristics were observed. This technique can be app lied to the monolithic integration of thin-film devices and waveguide- type optical devices with a vertical end facet. (C) 1996 Optical Socie ty of America