MICRO X-RAY PHOTOELECTRON-SPECTROSCOPY OF THE LASER-ABLATED SILICON SURFACE WITH A LASER-PRODUCED PLASMA X-RAY SOURCE

A laboratory-scale photoelectron microscope was constructed using a la ser-produced plasma X-ray source and a high resolution focusing mirror . The energy resolution of 2 eV and the spatial resolution of 20 mu m were obtained. To study a laser ablated silicon surface, Si 2p core le vel photoelectron spectra were examined before and after laser irradia tion. The peak energy of the photoelectron spectra was shifted from th at of the oxidized state to that of the unoxidized one. The result sho ws that the oxide layer of the silicon surface was removed after the l aser ablation. The microscope could be used to observe these states of the Si surface in situ.