SYNCHROTRON-RADIATION-INDUCED REACTIONS OF CONDENSED LAYER OF ORGANOSILICON COMPOUNDS

We have studied the synchrotron radiation (SR) induced chemical reacti ons of condensed layers of silicon alkoxides, Si(OCH3)(4) and Si(OC2H5 )(4), and tetramethylsilane Si(CH3)(4) on a Si substrate at 80 K. Phot on-stimulated desorption (PSD) measurements show that irradiation with SR in the vacuum-ultraviolet (VUV) region initiates the desorption of H-2, hydrocarbons, and CO from the condensed layer, indicating that V UV-SR decomposes the alkoxyl and methyl groups of the organosilicon co mpounds. It is found that the kinetics of desorption of CO differs fro m that of hydrogen and hydrocarbons. Infrared and photoemission data d emonstrate that Si-containing fragments produced by the decomposition of organosilicon molecules are polymerized to generate SiO2 and amorph ous SiC.