M. Oshima et al., INITIAL-STAGES OF NANOCRYSTAL GROWTH OF COMPOUND SEMICONDUCTORS ON SISUBSTRATES, Journal of electron spectroscopy and related phenomena, 80, 1996, pp. 129-132
we grew compound semiconductor nanocrystals on passivated Si surfaces,
which were characterized by photoelectron spectroscopy and RHEED (ref
lection high energy electron diffraction). The Ga-deposited Si(111) su
rface with a 1x1 RHEED pattern was significantly converted into GaSb n
anocrystals by Sb beam irradiation at 500 degrees C. In order to grow
better quality GaSb nanocrystals, Se-terminated Si surfaces were emplo
yed, and about 20 nm uniform GaSb nanocrystals were grown, whose cryst
allinity of good quality was verified by cross-sectional TEM. For InAs
nanocrystals, hydrogen-terminated Si surfaces are suitable for growth
at as low substrate temperature as 300 degrees C.