M. Hasegawa et al., SOFT-X-RAY SCANNING PHOTOELECTRON MICROSCOPE USING WOLTER-TYPE FOCUSING MIRROR, Journal of electron spectroscopy and related phenomena, 80, 1996, pp. 361-364
The soft x-ray scanning photoelectron microscope has been developed an
d installed at a soft x-ray beamline of the Photon Factory (KEK-PF). T
he microscope uses a Welter type-I grazing incidence mirror to form a
soft xray microbeam. The mirror was fabricated more accurately than pr
evious one by using a new replication method, allowing a 0.47-mu m mic
robeam to be ahcieved. In addition, a high-precision x-y sample stage
made it possible to obtain two dimensional photoelectron images. The m
icroscope demonstrated a total-photoyield image of 0.3-mu m-linewidth
stripe patterns and an energy-selected photoelectron image of 2-mu m-l
inewidth stripe patterns.