HIGH-RATE DISSOLUTION OF COPPER IN CUPRIC-SULFATE ELECTROLYTES

Authors
Citation
R. Vidal et Ac. West, HIGH-RATE DISSOLUTION OF COPPER IN CUPRIC-SULFATE ELECTROLYTES, Electrochimica acta, 41(15), 1996, pp. 2417-2424
Citations number
22
Categorie Soggetti
Electrochemistry
Journal title
ISSN journal
00134686
Volume
41
Issue
15
Year of publication
1996
Pages
2417 - 2424
Database
ISI
SICI code
0013-4686(1996)41:15<2417:HDOCIC>2.0.ZU;2-R
Abstract
The mass-transfer-limited dissolution of copper in acidic and binary c upric-sulfate solutions is investigated. The dissolution produces a du ll surface with a coarse microtexture. This system has an unusually la rge limiting-current plateau, where a salt film precipitates. The film is characterized with steady polarization measurements as well as AC- impedance and flow-modulation spectroscopy. A low-field, film-conducti on mechanism explains best the high-frequency region of the AC-impedan ce spectrum. The electrochemical behavior of the system is compared to other high-rate metal-dissolution systems. Shortcomings of present sa lt-film models are discussed. Copyright (C) 1996 Elsevier Science Ltd