Soluble polythiophenes with functional acrylic moieties in the side ch
ain can be prepared by copolymerization of hexylthiophene and an acryl
ated thiophene. Short reaction times are required to inhibit the acryl
ic function to interfere with the oxidative thiophene polymerization w
ith FeCl3. Preliminary irradiation experiments have shown that the cop
olymers act as negative resists in electron-beam (EB)-lithographic pro
cedures, and can lead to conductive patterns.