REFLOW OF BEF2-B2O3-GEO2-SIO2 GLASSES AND APPLICATION OF THEIR MEMBRANES TO METAL-OXIDE-SILICON (MOS) CAPACITORS

Citation
K. Kobayashi et I. Mizushima, REFLOW OF BEF2-B2O3-GEO2-SIO2 GLASSES AND APPLICATION OF THEIR MEMBRANES TO METAL-OXIDE-SILICON (MOS) CAPACITORS, Materials science & engineering. B, Solid-state materials for advanced technology, 39(3), 1996, pp. 224-227
Citations number
19
Categorie Soggetti
Material Science","Physics, Condensed Matter
ISSN journal
09215107
Volume
39
Issue
3
Year of publication
1996
Pages
224 - 227
Database
ISI
SICI code
0921-5107(1996)39:3<224:ROBGAA>2.0.ZU;2-K
Abstract
The capacitance-voltage (C-V) characteristics of metal-oxide-silicon ( MOS) capacitors passivated by BeF2-B2O3-GeO2-SiO2 glasses with various water and fluoride contents were investigated. As the OH- absorption coefficient of the glass increased, adverse effects on the recovery of hysteresis loops of C-V curve shifts were observed. The water content is closely related to the fluoride content in the BeF2-B2O3-GeO2-SiO2 glass. The viscous flow paint of the glass was lowered with increasin g degree of ionic character obtained from Hannay's equation. The norma l C-V curve shift was observed for the MOS capacitors passivated with the glass with 25% BeF2.