Charge transfer in Si(P-3, D-1) + H+ collisions is studied theoretical
ly by using a semiclassical molecular representation with six molecula
r channels for the triplet manifold and four channels for the singlet
manifold at collision energies above 30 eV, and by using a fully quant
um mechanical approach with two molecular channels for both triplet an
d singlet manifolds below 30 eV. The ab initio potential curves and no
nadiabatic coupling matrix elements for the HSi+ system are obtained f
rom multireference single- and double-excitation configuration interac
tion (MRD-CI) calculations employing a relatively large basis set. The
present rate coefficients for charge transfer to Si+(P-4) formation r
esulting from H+ + Si((3)p) collisions are found to be large with valu
es from 1 x 10(-10) cm(3) s(-1) at 1000 K to 1 x 10(-8) cm(3) s(-1) at
100,000 K. The rate coefficient for Si+(P-2) formation, resulting fro
m H+ + Si(P-3) collisions, is found to be much smaller because of a la
rger energy defect from the initial state. These calculated rates are
much larger than those reported by Baliunas & Butler, who estimated a
value of 10(-11) cm(3) s(-1) in their coronal plasma study. The presen
t result may be relevant to the description of the silicon ionization
equilibrium.