HCP AND BCC CU AND PD FILMS

Citation
H. Wormeester et al., HCP AND BCC CU AND PD FILMS, Physical review letters, 77(8), 1996, pp. 1540-1543
Citations number
17
Categorie Soggetti
Physics
Journal title
ISSN journal
00319007
Volume
77
Issue
8
Year of publication
1996
Pages
1540 - 1543
Database
ISI
SICI code
0031-9007(1996)77:8<1540:HABCAP>2.0.ZU;2-N
Abstract
Epitaxial hcp and bcc Cu and Pd films were grown on W(100). The epitax ial relation of the hcp films is determined by reflection high energy electron diffraction (RHEED) as <(11(2)over bar 0> parallel to (100) a nd [0001] parallel to [011]. The growth of hcp Cu and Pd is attributed to the much smaller misfit for this hcp orientation in either the <[1 (1)over bar 00] or [0001] direction, respectively, than for any fee or ientation. This misfit difference overcomes the energy difference betw een hcp and fcc crystal structure. The atomic diameter of Pd is near t hat of W, which also gives a good fit for bcc pseudomorphic Pd. The en ergy difference between hcp and bcc determines the structure. X-ray ph otoelectron diffraction measurements show a bcc Pd film, transmission RHEED hcp islands.