SYNTHESIS OF NOVEL THIN-FILM MATERIALS BY PULSED-LASER DEPOSITION

Citation
Dh. Lowndes et al., SYNTHESIS OF NOVEL THIN-FILM MATERIALS BY PULSED-LASER DEPOSITION, Science, 273(5277), 1996, pp. 898-903
Citations number
56
Categorie Soggetti
Multidisciplinary Sciences
Journal title
ISSN journal
00368075
Volume
273
Issue
5277
Year of publication
1996
Pages
898 - 903
Database
ISI
SICI code
0036-8075(1996)273:5277<898:SONTMB>2.0.ZU;2-6
Abstract
Pulsed laser deposition (PLD) is a conceptually and experimentally sim ple yet highly versatile tool for thin-film and multilayer research. I ts advantages for the film growth of oxides and other chemically compl ex materials include stoichiometric transfer, growth from an energetic beam, reactive deposition, and inherent simplicity for the growth of multilayered structures. With the use of PLD, artificially layered mat erials and metastable phases have been created and their properties va ried by control of the layer thicknesses. In situ monitoring technique s have provided information about the role of energetic species in the formation of ultrahard phases and in the doping of semiconductors. Cl uster-assembled nanocrystalline and composite films offer opportunitie s to control and produce new combinations of properties with PLD.