CHARACTERIZATION OF BIAS ENHANCED MWCVD DIAMOND THIN-FILMS

Citation
Mmg. Poza et al., CHARACTERIZATION OF BIAS ENHANCED MWCVD DIAMOND THIN-FILMS, Materials letters, 29(1-3), 1996, pp. 111-115
Citations number
18
Categorie Soggetti
Material Science","Physics, Applied
Journal title
ISSN journal
0167577X
Volume
29
Issue
1-3
Year of publication
1996
Pages
111 - 115
Database
ISI
SICI code
0167-577X(1996)29:1-3<111:COBEMD>2.0.ZU;2-I
Abstract
Diamond films deposited by MWCVD (microwave assisted chemical vapor de position) after bias enhanced nucleation have been characterized by Ra man spectroscopy (RS), scanning electron microscopy (SEM) and electric measurements. The diamond/graphite ratio in the films, as measured by RS and verified by electric measurements, depends on the methane conc entration during the growth step and the temperature in the bias stage , The higher the diamond content in the films, the better dielectric p roperties they exhibit. The de conductivity of these films is always l ower than those measured in films grown on scratched substrates. Thus, diamond films with low de conductivities, similar to natural diamond, could be deposited choosing the appropriate bias nucleation condition s.