ORIGIN OF THE 430 K TL PEAK IN THERMOCHEMICALLY REDUCED ALPHA-AL2O3

Citation
M. Springis et al., ORIGIN OF THE 430 K TL PEAK IN THERMOCHEMICALLY REDUCED ALPHA-AL2O3, Radiation protection dosimetry, 65(1-4), 1996, pp. 231-234
Citations number
10
Categorie Soggetti
Radiology,Nuclear Medicine & Medical Imaging","Nuclear Sciences & Tecnology
ISSN journal
01448420
Volume
65
Issue
1-4
Year of publication
1996
Part
1
Pages
231 - 234
Database
ISI
SICI code
0144-8420(1996)65:1-4<231:OOT4KT>2.0.ZU;2-9
Abstract
Thermo- and optically stimulated processes are studied in reduced alph a-Al2O3 excited by X rays or UV light. It is shown that the 430 K TL p eak and OSL band at 2.7 eV is caused by release of electrons from trap s followed by recombination mainly at F+ centres and resulting in F ce ntre emission. Traps responsible for the composite 430 K TL peak and i nduced 2.7 eV absorption band are caused by several kinds of defects o f an electronic nature. Production of free electrons by selective UV e xcitation in the region of the absorption of F centres results in effe ctive filling of all kinds of traps responsible for the 430 K TL peak, whereas free electrons and holes produced by X ray excitation competi tively recombine via various localised electronic states, which result s in lowered efficiency of the accumulation of the light sum and selec tive filling of different kinds of traps, responsible for the 430 K TL peak.