SYNTHESIS AND SPECTROSCOPIC CHARACTERIZATION OF MOO3 THIN-FILMS

MoO2(acac)(2) has been used as a precursor for the one-step MOCVD of s ilica- and zirconia-supported MoO3. Pure films were obtained by suitab le control of the deposition parameters. The films were characterised by W-VIS spectroscopy, XRD, SEM, wavelength-dispersive X-ray fluoresce nce analysis and XPS. Silica-supported MoO3 consists of a layered stru cture packed in the direction of the b axis whilst no preferential ori entation was observed for the zirconia-supported films. Films deposite d using higher O-2/MoO2(acac)(2) molar ratios consist of pure MoO3, wh ilst lower O-2/MoO2(acac)(2) values result in the copresence of some M o suboxides. Deposition rates appear to be largely governed by the O-2 /MoO2(acac)(2) molar ratio and they always increase upon decreasing th is parameter. Larger crystallite sizes were found to be associated wit h slower rate regimes.