ELECTRONIC DIFFUSIVITY MEASUREMENT IN SILICON BY PHOTOTHERMAL MICROSCOPY

Citation
Bc. Forget et al., ELECTRONIC DIFFUSIVITY MEASUREMENT IN SILICON BY PHOTOTHERMAL MICROSCOPY, Applied physics letters, 69(8), 1996, pp. 1107-1109
Citations number
21
Categorie Soggetti
Physics, Applied
Journal title
ISSN journal
00036951
Volume
69
Issue
8
Year of publication
1996
Pages
1107 - 1109
Database
ISI
SICI code
0003-6951(1996)69:8<1107:EDMISB>2.0.ZU;2-C
Abstract
In this letter we demonstrate that a photothermal microscopy experimen t can be used to determine the electronic diffusivity (or carrier mobi lity) in the same way it is now widely used to measure locally thermal diffusivity of various nonsemiconductor materials. The main difficult y lies in the fact that in order to separate thermal and carrier diffu sion, the experiment must be performed for a relatively large distance between the pump and probe beams. Photothermal signals are therefore rather weak and great experimental care must be taken. We present and discuss experimental results on Si. (C) 1996 American Institute of Phy sics.