Y. Pacaud et al., MICROSTRUCTURAL CHARACTERIZATION OF AMORPHIZED AND RECRYSTALLIZED 6H-SIC, Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms, 120(1-4), 1996, pp. 181-185
The mode of recrystallization of 6H-SiC implanted at 200 keV with a do
se of 1 x 10(15) Ge+ cm(-2) and subsequently annealed at 1500 degrees
C for 10 min, was studied by combined cross-section and planar view tr
ansmission electron microscopy techniques. The type of defects develop
ed during recrystallization and their role in the 6H to 3C (cubic) tra
nsformation of the recrystallized zone is discussed. The instability o
f the 6H-SiC polytype and the domination of the 3C-SiC is attributed t
o the inability to apply the step-controlled growth mechanism, which i
s essential for the growth of 6H-SiC, in the amorphous zone.