Jg. Correia et al., RADIATION-DAMAGE ANNEALING OF HG IMPLANTED INP, Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms, 120(1-4), 1996, pp. 244-247
The formation of shallow p-type layers in InP has been previously achi
eved by Hg implantation, In this work, for the first time, microscopic
information of the near surrounding of the Hg dopant and the recovery
of the damaged layer is derived combining RES and hyperfine interacti
ons studies. It is shown that most of the radiation damage created by
the implantation can be recovered with a two step furnace annealing at
400 degrees C and 800 degrees C using a proximity cap.