FORMATION AND PHOTOOXIDATION OF N-DODECANETHIOL SELF-ASSEMBLED MONOLAYERS ON AU(111) - PITS FORMED DURING CHEMISORPTION DISAPPEAR UPON OXIDATION

Authors
DISHNER MH FEHER FJ HEMMINGER JC
Citation
Mh. Dishner et al., FORMATION AND PHOTOOXIDATION OF N-DODECANETHIOL SELF-ASSEMBLED MONOLAYERS ON AU(111) - PITS FORMED DURING CHEMISORPTION DISAPPEAR UPON OXIDATION, Chemical communications, (16), 1996, pp. 1971-1972
Citations number
35
Categorie Soggetti
Chemistry
Journal title
Chemical communications → ACNP
ISSN journal
13597345
Issue
16
Year of publication
1996
Pages
1971 - 1972
Database
ISI
SICI code
1359-7345(1996):16<1971:FAPONS>2.0.ZU;2-U
Abstract
UV photolysis in air of self-assembled n-dodecanethiol monolayers (SAM s) on Au(111) quantitatively oxidizes the adsorbed thiol to its corres ponding sulfonate and completely destroys the ordered structure of the SAM without exposing the underlying gold surface; STM images indicate that the etch pits which appear to form during chemisorption of the t hiol are lost when the thiol is oxidized.