POLISHING RATE FOR (100) AND (110) SURFACES

Authors
HASEGAWA Y MIYAZIMA S
Citation
Y. Hasegawa et S. Miyazima, POLISHING RATE FOR (100) AND (110) SURFACES, Physica. A, 233(3-4), 1996, pp. 663-671
Citations number
4
Categorie Soggetti
Physics
Journal title
Physica. A → ACNP
ISSN journal
03784371
Volume
233
Issue
3-4
Year of publication
1996
Pages
663 - 671
Database
ISI
SICI code
0378-4371(1996)233:3-4<663:PRF(A(>2.0.ZU;2-J
Abstract
We have suggested a simple model for polishing. The model introduced i mages a float polishing method. We analyze the roughness of the surfac e during the polishing process from a fractal point of view. The prese nt model provides results in agreement with the experimental fact that the (110) surface of Si is polished faster than (100).