A CHEMICAL-STATE RESOLVED X-RAY PHOTOELECTRON DIFFRACTION STUDY - INITIAL-STAGES IN DIAMOND-LIKE CARBON-FILM DEPOSITION

Authors
AGOSTINO RG KUTTEL OM AEBI P FASEL R OSTERWALDER J SCHLAPBACH L
Citation
Rg. Agostino et al., A CHEMICAL-STATE RESOLVED X-RAY PHOTOELECTRON DIFFRACTION STUDY - INITIAL-STAGES IN DIAMOND-LIKE CARBON-FILM DEPOSITION, Journal of applied physics, 80(4), 1996, pp. 2181-2186
Citations number
22
Categorie Soggetti
Physics, Applied
Journal title
Journal of applied physics → ACNP
ISSN journal
00218979
Volume
80
Issue
4
Year of publication
1996
Pages
2181 - 2186
Database
ISI
SICI code
0021-8979(1996)80:4<2181:ACRXPD>2.0.ZU;2-O
Abstract
The structural sensitivity of x-ray photoelectron diffraction is great ly enhanced by the acquisition of a full hemispherical diffraction pat tern of chemically shifted core levels. Complex systems can be studied resolving the local order per element and per chemical environment. T his technique is applied to study the earliest stages of hydrogenated diamondlike carbon film deposition on Si(001). Effects of the sample t emperature and ion dose on the structure of deposited layers are discu ssed. (C) 1996 American Institute of Physics.