RAPID THERMAL ANNEALING USING THE COMBUSTION OF H-2 WITH N2O

The combustion of H-2 gas with N2O gas was investigated in order to ra pidly heat substrate to a high temperature. A transient thermometry wi th a 100-nm-thick Cr film as a temperature sensor formed on quartz sub strate was used to measure temperature change at the surface. The gas combustion was induced by heating a W filament. It propagated with a v elocity higher than 100 m/s throughout a chamber for an initial total gas pressure of 500 Torr ([H-2]/[N2O]=1). The sample surface is heated to 800 degrees C for an initial substrate temperature at 300 degrees C. The full heating time width at half maximum was 4.5 ms. This letter shows a possibility of millisecond-order rapid thermal treatment. (C) 1996 American Institute of Physics.