VOLTAGE SHIFT AND DEFORMATION IN THE HYSTERESIS LOOP OF PB(ZR,TI)O-3 THIN-FILM BY DEFECTS

Citation
Eg. Lee et al., VOLTAGE SHIFT AND DEFORMATION IN THE HYSTERESIS LOOP OF PB(ZR,TI)O-3 THIN-FILM BY DEFECTS, Applied physics letters, 69(9), 1996, pp. 1223-1225
Citations number
14
Categorie Soggetti
Physics, Applied
Journal title
ISSN journal
00036951
Volume
69
Issue
9
Year of publication
1996
Pages
1223 - 1225
Database
ISI
SICI code
0003-6951(1996)69:9<1223:VSADIT>2.0.ZU;2-1
Abstract
Voltage shift and deformation in the hysteresis loop of Pb(Zr,Ti)O-3 ( PZT) capacitors have been studied by varying the annealing temperature after patterning the top sputter-deposited Pt electrode using reactiv e ion etch (RIE) with Ar gas. It was observed that the hysteresis loop of the film was seriously deformed by both sputtering and RTE induced defects. Voltage shift and polarization suppression can be explained by the charge trapping at electrode interfaces and at defect levels in the film, respectively. Space charges trapped at defect levels in the film suppress polarization parallel to poling direction, however, enh ance polarization opposite to the poling direction. (C) 1996 American Institute of Physics.