COMPUTER-SIMULATION OF DYNAMICS OF SURFACE GROWTH

It is shown that limited surface diffusion may strongly modify propert ies of the film surface. For linear samples, when some analytical resu lts are known for random deposition, the fractal dimension D of the su rface is discussed. Model predictions and computer simulation shows th at D < 1 for the static case, when assembly of clusters is scanned. Th e surface is smoother for positive binding energy between atoms, and m ore rough otherwise. With zero binding energy, analytical results of r andom growth is recovered.