M. Szymonski et al., THICKNESS DEPENDENT ELECTRON-STIMULATED DESORPTION OF THIN EPITAXIAL-FILMS OF ALKALI-HALIDES, Applied surface science, 101, 1996, pp. 102-106
Citations number
16
Categorie Soggetti
Physics, Condensed Matter","Chemistry Physical","Materials Science, Coatings & Films
Thin epitaxial NaCl layers of various thicknesses have been deposited
on (100) GaAs substrates and subsequently desorbed with a 1 keV electr
on beam. The film thickness was monitored with a quartz crystal microb
alance and verified by recording the substrate Ga 2p(1/2) (111 eV) pho
toelectron peak attenuation due to overlayer growth. Electronic and st
ructural properties of the freshly prepared films were subsequently in
vestigated in the attached analytical chamber by means of LEED, LEELS,
and AES, The signal intensities of desorbed alkali and halogen atoms
were detected with a quadrupole mass spectrometer. For the first time
the thickness dependence of the alkali halide electron stimulated deso
rption (ESD) yield was determined in absolute units. The experimental
results are well described by a simple diffusion equation indicating t
hat range dependent transport processes are involved in ESD of alkali
halides.