DESIGN OF AN ULTRAHIGH-VACUUM COMPATIBLE SYSTEM FOR STUDYING THE INFLUENCE OF ACOUSTIC-WAVES ON SURFACE CHEMICAL PROCESSES

Citation
T. Mitrelias et al., DESIGN OF AN ULTRAHIGH-VACUUM COMPATIBLE SYSTEM FOR STUDYING THE INFLUENCE OF ACOUSTIC-WAVES ON SURFACE CHEMICAL PROCESSES, Applied surface science, 101, 1996, pp. 305-310
Citations number
18
Categorie Soggetti
Physics, Condensed Matter","Chemistry Physical","Materials Science, Coatings & Films
Journal title
ISSN journal
01694332
Volume
101
Year of publication
1996
Pages
305 - 310
Database
ISI
SICI code
0169-4332(1996)101:<305:DOAUCS>2.0.ZU;2-L
Abstract
So far, there have only been very few studies on the effects of acoust ic waves (AWs) on chemical processes involving the gas-solid interface . Acoustic induced desorption of residual gases has been shown to prov ide an alternative desorption route to the well established electron o r photon induced and thermal excitation channels. It has also been sho wn that the catalytic activity of a thin film can be increased by acou stic excitation. A novel ultrahigh resolution tunable acoustic spectro meter has been designed and is described in this paper, capable of exc iting a chemical system with narrowband AWs. A special UHV compatible sample holder has also been designed for the excitation of a metal sin gle crystal with AWs, using an edge bonded transducer. For the first t ime, InterDigital Transducers with a thin metal single crystal bonded onto the piezoelectric substrate can be used to investigate acoustic i nduced desorption under UHV conditions.