The electrical properties of Zr/ and Ti/Si1-xGex/(100)Si heterostructu
res have been examined. The Schottky barrier heights (SBH's) of as-dep
osited diodes determined from I-V characteristics are 0.53 and 0.55 eV
for Zr/ and Ti/n-Si0.8Ge0.2, respectively. It can be seen that p-Si0.
8Ge0.2 diodes tend to have smaller SBH's than n-Si0.8Ge0.2 ones for bo
th metals. This fact is consistent with the contact resistivity measur
ed for Zr/n(+)- and (+)-Si0.8Ge0.2/(100)Si.Zr/p(+)-Si0.8Ge0.2/(100)Si.