STUDY OF HIGH-SENSITIVITY OF CHEMICALLY A MPLIFIED 3-COMPONENT POSITIVE EB RESIST

We studied the high sensitivity of a chemically amplified resist compo sed of a matrix resin, a dissolution inhibitor and an acid generator. We evaluated the dependence of sensitivity of the resist upon post exp osure baking (PEB) condition and acid generators. Triphenylsulfonium t riflate (S-Tf), diphenyliodonium triflate (I-Tf), triphenylsulfonium a ntimonate (S-Sb), and diphenyliodonium antimonate (I-Sb) were used. Th e higher the FEB time and the temperature, the better the sensitivity of the resist. The higher the concentration of S-Tf, the better this s ensitivity of the resist. When 3 wt% of acid generator was added to th e resist, the sensitivity of the resist was S-Tf (12.5 mu C/cm(2)) < S -Sb (10.0 mu C/cm(2)) < I-Tf (7.0 mu C/cm(2)) < I-Sb (5.0 mu C/cm(2)). When iodonium ion as cation was used, the sensitivity of the resist w as better. When antimonate ion as anion was used, the sensitivity of t he resist was better.