XPS AND X-RAY-DIFFRACTION STUDIES OF ALUMINUM-DOPED ZINC-OXIDE TRANSPARENT CONDUCTING FILMS

Citation
Mn. Islam et al., XPS AND X-RAY-DIFFRACTION STUDIES OF ALUMINUM-DOPED ZINC-OXIDE TRANSPARENT CONDUCTING FILMS, Thin solid films, 280(1-2), 1996, pp. 20-25
Citations number
32
Categorie Soggetti
Physics, Applied","Material Science","Physics, Condensed Matter
Journal title
ISSN journal
00406090
Volume
280
Issue
1-2
Year of publication
1996
Pages
20 - 25
Database
ISI
SICI code
0040-6090(1996)280:1-2<20:XAXSOA>2.0.ZU;2-S
Abstract
Aluminum-doped zinc oxide transparent conducting films are prepared by spray pyrolysis at different dopant concentrations. These films are s ubsequently characterized by X-ray diffractometric and X-ray photoelec tron spectroscopic (XPS) techniques. The results are compared with tho se obtained from pure zinc oxide films prepared under identical condit ions. X-ray diffraction measurements show an increase in lattice param eters (c and a) for aluminum-doped films while their ratio remains the same. This study also indicates that within the XPS detection limit t he films are chemically identical to pure zinc oxide. However, a diffe rence in the core-electron line shape of the Zn 2p(3/2) photoelectron peaks is predicted. An asymmetry in Zn 2p(3/2) photoelectron peaks has been observed for aluminum-doped films. The asymmetry parameters eval uated from core-electron line-shape analysis yield a value of the orde r of 0.04 +/- 0.01. The value is found to lie between those obtained f or pure zinc oxide and has been attributed to the presence of excess z inc in the films.