ELECTROCHEMICAL DEPOSITION OF MOS2 THIN-FILMS BY REDUCTION OF TETRATHIOMOLYBDATE

Authors
PONOMAREV EA NEUMANNSPALLART M HODES G LEVYCLEMENT C
Citation
Ea. Ponomarev et al., ELECTROCHEMICAL DEPOSITION OF MOS2 THIN-FILMS BY REDUCTION OF TETRATHIOMOLYBDATE, Thin solid films, 280(1-2), 1996, pp. 86-89
Citations number
15
Categorie Soggetti
Physics, Applied","Material Science","Physics, Condensed Matter
Journal title
Thin solid films → ACNP
ISSN journal
00406090
Volume
280
Issue
1-2
Year of publication
1996
Pages
86 - 89
Database
ISI
SICI code
0040-6090(1996)280:1-2<86:EDOMTB>2.0.ZU;2-X
Abstract
Molybdenum sulphide was cathodically electrodeposited from aqueous sol utions of sodium tetrathiomolybdate. The as-deposited films were X-ray amorphous with a composition, measured by microprobe analysis, close to MoS2. Annealing these films in Ar resulted in highly-textured films of MoS, with the van der Waals planes parallel to the substrate. A sm all expansion in the c spacing of the annealed films was explained by the presence of oxygen in the crystals. A direct bandgap of 1.78 eV wa s found for the annealed films.