CF4 GLOW-DISCHARGE MODIFICATION OF CH4 PLASMA POLYMER LAYERS DEPOSITED ONTO ASYMMETRIC POLYSULFONE GAS SEPARATION MEMBRANES

Authors
HOPKINS J BADYAL JPS
Citation
J. Hopkins et Jps. Badyal, CF4 GLOW-DISCHARGE MODIFICATION OF CH4 PLASMA POLYMER LAYERS DEPOSITED ONTO ASYMMETRIC POLYSULFONE GAS SEPARATION MEMBRANES, Langmuir, 12(17), 1996, pp. 4205-4210
Citations number
49
Categorie Soggetti
Chemistry Physical
Journal title
Langmuir → ACNP
ISSN journal
07437463
Volume
12
Issue
17
Year of publication
1996
Pages
4205 - 4210
Database
ISI
SICI code
0743-7463(1996)12:17<4205:CGMOCP>2.0.ZU;2-B
Abstract
Post CF4 glow discharge modification of methane plasma polymer layers deposited onto asymmetric polysulfone membranes has been investigated by XPS, FTIR, AFM, and gas permeability measurements. Oxygen and nitro gen gas permeability and permselectivity through the polysulfone subst rate are found to be strongly influenced by the plasma processing para meters.