Dk. Inia et al., NITROGEN DIFFUSION AND NITRIDE FORMATION DURING AND AFTER IMPLANTATION IN NI FE BILAYERS/, Surface & coatings technology, 83(1-3), 1996, pp. 65-69
At relatively low temperatures (room temperature and 200 degrees C) ni
trogen was introduced into an iron layer underneath a top layer of nic
kel. This was done by implanting the nitrogen into the Ni layer. It wa
s observed that subsequently part of the N diffuses into the Fe layer.
The concentration depth profiles of N in the Ni/Fe bilayers were reco
rded with the nuclear reaction analysis technique using the N-15(p,alp
ha)C-12 reaction at E(p)=1.02MeV. From these depth profiles, measured
as a function of implantation dose, implantation temperature and annea
l temperature, it was suggested that nitrides are formed in iron. To o
ur knowledge, nitride formation has not been reported before at such l
ow temperatures in the absence of radiation damage.