NITROGEN DIFFUSION AND NITRIDE FORMATION DURING AND AFTER IMPLANTATION IN NI FE BILAYERS/

Citation
Dk. Inia et al., NITROGEN DIFFUSION AND NITRIDE FORMATION DURING AND AFTER IMPLANTATION IN NI FE BILAYERS/, Surface & coatings technology, 83(1-3), 1996, pp. 65-69
Citations number
18
Categorie Soggetti
Materials Science, Coatings & Films
ISSN journal
02578972
Volume
83
Issue
1-3
Year of publication
1996
Pages
65 - 69
Database
ISI
SICI code
0257-8972(1996)83:1-3<65:NDANFD>2.0.ZU;2-X
Abstract
At relatively low temperatures (room temperature and 200 degrees C) ni trogen was introduced into an iron layer underneath a top layer of nic kel. This was done by implanting the nitrogen into the Ni layer. It wa s observed that subsequently part of the N diffuses into the Fe layer. The concentration depth profiles of N in the Ni/Fe bilayers were reco rded with the nuclear reaction analysis technique using the N-15(p,alp ha)C-12 reaction at E(p)=1.02MeV. From these depth profiles, measured as a function of implantation dose, implantation temperature and annea l temperature, it was suggested that nitrides are formed in iron. To o ur knowledge, nitride formation has not been reported before at such l ow temperatures in the absence of radiation damage.