NUCLEATION MECHANISM OF POLYCRYSTALLINE DIAMOND FILM DEPOSITED ON CERAMIC ALUMINA BY MICROWAVE PLASMA CHEMICAL-VAPOR-DEPOSITION

Authors
XIA YB MO YW WANG Y HUANG XQ CHEN DM WANG H
Citation
Yb. Xia et al., NUCLEATION MECHANISM OF POLYCRYSTALLINE DIAMOND FILM DEPOSITED ON CERAMIC ALUMINA BY MICROWAVE PLASMA CHEMICAL-VAPOR-DEPOSITION, Chinese Physics Letters, 13(7), 1996, pp. 557-560
Citations number
8
Categorie Soggetti
Physics
Journal title
Chinese Physics Letters → ACNP
ISSN journal
0256307X
Volume
13
Issue
7
Year of publication
1996
Pages
557 - 560
Database
ISI
SICI code
0256-307X(1996)13:7<557:NMOPDF>2.0.ZU;2-2
Abstract
Polycrystalline diamond films have been deposited on ceramic alumina s ubstrates by microwave plasma chemical vapor deposition method, Variat ion of the emission spectra in the microwave plasma with the microwave power and the vapor pressure in the reaction chamber is studied, resp ectively. Relationships between the hydrogen atomic spectra and the av erage energy of the electrons in the plasma, as well as the mechanism of diamond film deposition on ceramic alumina are discussed.