An electrically controlled, two state, phase modulated diffraction gra
ting is created by fabricating a vertical-cavity phase flip modulator
and etching the top of the structure into a series of stripes. The mod
ulator switches phase between 0 and 180 degrees with 7-V bias, Alterna
ting stripes are electrically isolated from the switching voltage as a
result of stripe etching. With zero bias, the etched device reflects
all normally incident light normal to the device. With bias, the light
is diffracted primarily into the first-order diffraction peaks. We de
monstrate this device, depict the parasitic effects of etching, and sh
ow the device design limitations.