THIN-FILM PROCESSES FOR HIGH-TEMPERATURE SUPERCONDUCTORS

Citation
V. Matijasevic et I. Bozovic, THIN-FILM PROCESSES FOR HIGH-TEMPERATURE SUPERCONDUCTORS, Current opinion in solid state & materials science, 1(1), 1996, pp. 47-53
Citations number
45
Categorie Soggetti
Material Science","Physics, Applied","Physics, Condensed Matter
ISSN journal
13590286
Volume
1
Issue
1
Year of publication
1996
Pages
47 - 53
Database
ISI
SICI code
1359-0286(1996)1:1<47:TPFHS>2.0.ZU;2-6
Abstract
Thin film processes have opened up new directions for research in the field of high-temperature superconductors, including the study of thei r fundamental physical properties, their application in electronics, a nd the synthesis of new superconducting compounds. In the past few yea rs great progress has been achieved. Uniform, double-sided wafers with large surface area are now being made for passive electronics compone nts. Advances in atomic layer engineering of precise heterostructures and multilayers are bringing forth a new generation of active devices. In spite of this progress, many challenges still remain in improving the control of thin film growth and understanding film microstructure.