K. Scherer et al., OPTICAL AND MECHANICAL CHARACTERIZATION OF EVAPORATED SIO2 LAYERS - LONG-TERM EVOLUTION, Applied optics, 35(25), 1996, pp. 5067-5072
Numerous characterizations were performed on 120-nm thick evaporated S
iO2 layers in order to understand how their features change as a funct
ion of deposition conditions and time. Density decreases with increasi
ng deposition pressure. It governs all the layer properties (refractiv
e index, hardness, and stress). In situ stress measurements show that
stress can be divided into intrinsic and water-induced components, res
pectively linked to local density (outside the pores) and porosity. In
trinsic stress increase with decreasing pressure is explained by a dim
inution of the Si-O-Si bond angle (IR measurements). Long-term evoluti
on is characterized by stress relaxation related to Si-O-Si strained b
ond hydrolysis. (C) 1996 Optical Society of America