SILICON DIOXIDE AND HAFNIUM DIOXIDE EVAPORATION CHARACTERISTICS FROM A HIGH-FREQUENCY SWEEP E-BEAM SYSTEM

Reactive oxygen evaporation characteristics were determined as a funct ion of the front-panel control parameters provided by a programmable, high-frequency sweep e-beam system. An experimental design strategy us ed deposition rate, beam speed, pattern, azimuthal rotation speed, and dwell time as the variables. The optimal settings for obtaining a bro ad thickness distribution, efficient silicon dioxide boule consumption , and minimal hafnium dioxide defect density were generated. design an alysis showed the compromises involved with evaporating these oxides. (C) 1996 Optical Society of America