INTERACTION OF GA ADSORBATES WITH DANGLING BONDS ON THE HYDROGEN-TERMINATED SI(100) SURFACE

Citation
T. Hashizume et al., INTERACTION OF GA ADSORBATES WITH DANGLING BONDS ON THE HYDROGEN-TERMINATED SI(100) SURFACE, JPN J A P 2, 35(8B), 1996, pp. 1085-1088
Citations number
19
Categorie Soggetti
Physics, Applied
Volume
35
Issue
8B
Year of publication
1996
Pages
1085 - 1088
Database
ISI
SICI code
Abstract
Adsorption of Ga on the hydrogen terminated Si(100)-2 x 1-H surface ha s been investigated by scanning tunneling microscopy (STM). We have fo und that the thermally deposited Ga atoms preferentially adsorb on the hydrogen-missing dangling bonds and on the surface impurities. We des orb hydrogen atoms by the STM current and fabricate atomic-scale dangl ing-bond wires, in the similar way as was reported by Lyding et al. [A ppl. Phys. Lett. 64 (1994) 2010]. In order to fabricate more detailed dangling bond structures, several methods of manipulating (detaching, attaching and moving) the individual hydrogen atoms are tested. We are able to thermally deposit Ga atoms on a dangling-bond wire and fabric ate an atomic-scale Ga wire on the Si surface.